Associate professor
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Affiliation of Author(s):数学与统计学院
Teaching and Research Group:信息与计算科学教研室
Journal:Information Computing and ApplicationsInformation Computing and Applications
Funded by:国家自然科学基金项目
Key Words:radiation intensity of illumination; computer simulation; Photo-assisted
Abstract:In order to avoid the macroscopically inhomogeneous characteristics of large area films which prepared by Photo-assisted MOCVD (Metal Organic Chemical Vapor Deposition), processed by RIP (Rapid isothermal processing) technique, etc., the calculation of luminance uniformity is necessary. This thesis gives a basic calculation method about the radiation intensity of illumination caused by halogen-tungsten lamp like line radiation sources. A concept of average radiation intensity (ARI) of illumination was proposed to give quantification when radiation intensity is Rapidly Changed. The distribution of radiation sources influence on ARII is discussed. The numerical solution carried out by computer simulation directly confirms that the layout of radiation sources in this paper enhances the luminance uniformity. Consequently, the macroscopically inhomogeneous of the film is improved.
First Author:chenjia
Indexed by:Essay collection
Page Number:2
Translation or Not:no
Date of Publication:2011-10-10
